A bi-weekly event to present and discuss issues related to developments, applications and commercialization of nanotechnology.

Low cost, high thoughput lithography for nanoarray prototyping and manufacturing.

Speakers: Dr. Paul Ruchhoeft & Dr. Jack Wolfe
Department of Electrical and Computer Engineering
University of Houston.

(VIDEO CONFERENCED FROM THE HOUSTON OFFICE OF WINSTEAD SECHREST & MINICK P.C.)

Abstract: In this talk, we will describe the use of ion and atom beam proximity lithography in a variety of research projects at the University of Houston. These unique patterning technologies are capable of forming sub-10nm features over very large areas, have a large depth of field (over 400 microns for sub-50nm features), and have a throughput approaching one square meter per hour. We will describe the fabrication technology and highlight results in the patterning of spherical substrates and in the fabrication of infrared frequency selective surfaces, water filtration membranes, magnetic media, micro-immersion lens arrays, and corner cube retroreflectors. We will also describe our plans for a shared facility that allows access to the printing technology by other researchers.

Bio: Dr. Paul Ruchhoeft is an Assistant Professor of Electrical and Computer Engineering at the University of Houston and is the author of over 20 archival publications ranging from the fundamentals to applications of nanolithography. His research interests include micro-and nano-fabrication using ion beam proximity lithography, thin-film deposition and etching, development of retroreflector-based diagnostic tools, and the modeling of resist exposure and development.

Dr. Jack Wolfe received his Ph.D. in Physics from the University of Rochester in 1974. He joined the Department of Electrical Engineering at the University of Houston in 1976 where he founded their program in nanofabrication. His interests include advanced lithography, charged particle optics, plasma etching, and thin film deposition. He served as Interim Dean of the Cullen College of Engineering from 1996-1999. He was Program Chair of the 1999 International Conference on Electron, Ion, and Photon beam Technology and Nanofabrication (EIPBN), the premier conference on lithography and nanofabrication.

VENUE: You may attend the presentation from any one of these law offices of Winstead Sechrest & Minick P.C. or from UT Dallas

Event Coordinators:
Richard Fink 512-339-5020x130 dfink@appliednanotech.net
Max Roundhill 512-339-5020x120 mroundhill@appliednanotech.net

Chairman: Dr. Zvi Yaniv

Registration deadline is Friday, September 22 at 5:00 PM Central.

To register, please send an email to Deepika Misra dmisra@winstead.com with your preferred attendance location.