|
Nanotechnology Colloquium
|
Colloquium Date: Monday, August 17, 2009
|
A bi-weekly event to present and discuss issues related to developments, applications and commercialization of nanotechnology.
"Dimensional metrology with sub-nanometer uncertainty"
Vladimir A. Ukraintsev
President and Founder of
Nanometrology International, Inc. / Dallas, TX
(VIDEO CONFERENCED from Dallas, TX)
Abstract:
The 2007 edition of International Technology Roadmap for Semiconductors (ITRS) has introduced a new metric for metrology quality - measurement uncertainty (MU). For decades reproducibility of measurements or precision was used as a metrology metric. The new metric, MU, has precision as one of many uncertainty components. Additional significant components are tool matching, sampling uncertainty, sample-to-sample bias variation, probe-sample interaction (shrinkage, charging, carbonization), etc. The ITRS keeps the list open-ended concluding with the "other" component.
Once critical dimensions (CD) reach range of 100 nm and, therefore, needed for proper process control metrology MU reaches 1-2 nm, sampling and bias variation components usually start to dominate. It is a real challenge to keep sample-to sample bias variation of scanning electron microscopy (SEM) and optical scatterometry (OCD) at a nanometer level. Unless special measures are taken MU of CD SEM and OCD could easily exceed 2-4 nm. This fact is well documented. MU can be measured accurately only if a reference metrology (RM) is employed. Therefore, use of RM becomes a must if true MU to be evaluated. Unfortunately, choice of RM tools is very limited. CD atomic force microscope (AFM) is a possible choice. Independence of CD AFM bias from proximity effects, sample material, dimensions, shape as well as thorough sampling statistics and SI-traceability make AFM a good candidate for RM in many practical cases. Recent developments and studies suggest that CD AFM may provide sub-nanometer MU for some key semiconductor applications.
How one may achieve a long-term sub-nanometer MU of in-line process control metrology? In this work we suggest a simple but efficient and tested way of establishing CD metrology with sub-nanometer MU. The method consists of 3 steps:
- " Creating technology representative set of "golden" samples calibrated using SI-traceable CD AFM.
- " Minimizing MU of in-line metrology using pre-calibrated "golden" samples (tool, settings, model selection and tuning).
- " Employing in-line RM tool for systematic verification of bias of in-line "work horse" metrology. Preventing of in-line metrology bias excursions.
We conclude that RM is a must for achieving needed today sub-nanometer MU of CD metrology. To insure long-term performance of in-line metrology and, therefore, reliable process control we recommend employment of in-line RM system. SI-traceable CD AFM is a proper RM tool for the task.
Bio:
Vladimir Ukraintsev, Ph.D.
Vladimir Ukraintsev earned his Ph.D. in Solid State Physics from Moscow Institute for Engineering Physics. Before forming his own company in 2009, Vladimir worked at Veeco Instruments as a Technical Marketing Director and also was developing metrology solutions for 6 technologies at Texas Instruments. Vladimir worked at Academy of Science of the USSR, Universities of Virginia and Pittsburgh. Vladimir has more than 60 scientific publications in surface science, photochemistry, semiconductor characterization and metrology. Vladimir's prime interest is a reference dimensional metrology and its industrial applications in semiconductors and nanotechnology.
|
|
|
VENUE: You may attend the presentation from any
one of the following locations.
|
|
AUSTIN: Winstead PC
401 Congress Av., Ste 2100
Austin, TX 78701
512-370-2800
|
|
CHICAGO: Illinois Institute of Technology
Stuart Building, Room 212, 10 West 31st Street Chicago
IL 60616; Contact Jennifer Keplinger at keplinger@iit.edu to confirm attendence
|
|
|
DALLAS: Winstead PC
5400 Renaissance Tower, 1201 Elm Street
Dallas, TX 75270; 214-745-5400
|
|
EL PASO: El Paso Community College
9050 Viscount, Bldg. B
El Paso, TX 79925
|
|
|
HOUSTON: Winstead PC
1100 JPMorgan Chase Tower
600 Travis Street
Houston, TX 77002
713-650-8400
|
|
|
SAN ANTONIO: Winstead PC
700 N. St Mary St., Ste 1900
San Antonio, TX 78205
210-277-6800
|
|
|
THE WOODLANDS: Winstead PC
600 Town Center One
1450 Lake Robbins Drive
The Woodlands, TX 77380
281-681-5900
|
|
|
Program begins at 11:30am [CDT] with a complimentary lunch provided by Winstead PC.
Presentation begins at 12:00pm.
Event Coordinators:
Richard Fink 512-339-5020x130 dfink@appliednanotech.net
Max Roundhill 512-339-5020x120 roundhill@appliednanotech.net
Chairman: Dr. Zvi Yaniv
Registration deadline is Friday, August 14 at 5:00 PM Central.
To register, please send an email to Nina Shuvalov
NShuvalov@appliednanotech.net with your preferred attendance location.
|
| |
|
|
NANOMATERIALS APPLICATION CENTER
Walt Trybula, Ph.D.
Director
Texas State University
San Marcos, TX
(512) 245-6062
|
DVDs of selected presentations from previous
speakers are available for a small fee (contact
Max Roundhill mroundhill@appliednanotech.net)
NanoExpress, a monthly email newsletter, is
devoted to providing information on technological
advances, applications, and business news to
nanotechnology professionals. To subscribe, go to
the web link
http://www.txstate.edu/nac/nanoexpress.htmlx
Return to the Schedule Page
|
|
